Zhuozhou Xinyao Machinery Manufacturing Co., Ltd.

CMP

  

  • Description

XS - 150 Smart

Excellent performance: Polishing/cleaning
Process mode: Dry in dry out Used in third-generation semiconductor, MEMS and other manufacturing processes.Multi zone polishing head
Compatible with 6/8- inch wafers Flexible process matching High output rate Meet mature process technology requirements

 

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