No. 63 of Lousangmiao Village Songlindian Town,
Zhuozhou, Hebei, China.
sputter
It is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The equipment is equipped with 6PCS 2-inch confocal ultra-high vacuum cathodes, which can choose vertical sputtering, automatic transmission, reactive sputtering, film thickness measurement and other configurations. It can meet the needs of laboratory or enterprise laboratories process researches, and has the characteristics of simple maintenance and stable operation.
- Wafer size: 4-inch backward compatible
- Coating uniformity: Better than ±2%
- Ultimate vacuum: Better than 1×10-9mbar (metal seal); Better than 1×10-8mbar (rubber seal)
- Temperature control: RT-800℃, optionally up to 1200℃
- Number of cathodes: 6~7PCS 2inch, confocal sputtering
- Power supply: DC, RF, DC Pulse
- Deposition accuracy: 0.1nm
- Floor area: 3m*2m*2m (L*W*H)
- Options: Cryogenic pump, vertical sputtering, automatic transmission, reactive sputtering, film thickness meter, RGA, process menu, etc.
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